Tantalum Crucibles - Low Form - 20 mL to 55 mL


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One of the most corrosion resistant materials available, exhibits resistance to acid attack comparable to glass.

Tantalum is one of the most corrosion resistant materials available, exhibiting resistance to acid attack comparable to glass and platinum. This, combined with high-temperature strength makes tantalum an excellent material for laboratory crucibles, vessels and tubing.

Tantalum exhibits high resistance to boiling aqua regia and displays almost complete immunity to attack by most acids including sulfuric, hydrochloric and nitric. It is completely resistant to molten metals such as magnesium, potassium, lithium and sodium to 1100 ̊ C. Tantalum can be heated up to 2800 ̊ C in inert or oxygen-free atmospheres. We offer a standard line of crucibles and covers from 5 ml to 1000 ml and can also supply custom vessels and tubing.

 Tantalum Crucibles - Low Form - 20 mL to 55 mL


Product Details

Tantalum is corrosion resistant, due to a tenaciously adherent oxide film akin to the entire family of passive, reactive metals. The metal has gained acceptance for use in electronics, missile technology, the chemical industry and the medical field. Tantalum is immune to attack by many acids and salt solutions. It is, however, subject to hydrogen embrittlement in alkaline solutions. It is used to fabricate heat exchangers, reaction vessels, bayonet heaters, thermo wells, surgical implants and radiation shielding. Tantalum should not be used in air at temperatures above about 300°C because of severe oxidation.

Additional Information


Tantalum's resistance to corrosion by many materials is exemplified in the following Corrosion Resistance Table.

Acetic Acid
  20-392° (68-738°F), all concentrations: No attack
Air or Oxygen
  At room temperature: practically stable   /   Above 600°C (1112°F): formation of protective surfaces of Ta oxides
Aqueous Ammonia
  Practically no attack
Aqua Regia
  Cold and hot: practically no attack
Carbon (Graphite)
  At high temperatures: carbide formation

Carbon Dioxide
  Above 1200°C (2912°F): oxidation
Carbon Monoxide
  At red heat: reaction (absorption of C and O)   /   In high vacuum above 1400°C: formation of CO
Chromic Chloride Acid
  20-100°C (68-212°F), concentrated: no attack
Aqueous Caustic
  Cold: practically stable   /   Hot: noticeable attack
Molten Caustic

  at 250°C (464°F): beginning attack   /   Above 450°C (842°F): violent reaction
Ferric Chloride
  19°C (66°F) Boiling, 5-30% concentration: no attack
  Above 800-1000°C (1472-1832°F): carbide formation   /   Above 1400°C (2552°F): complete carburizing
Hydrochloric Acid
  Cold and Hot: no attack
Hydrofluoric Acid
  Strong Attack

Hydrofluoric and Nitric Acid
  Rapid dissolution
  Above 300-400°C (572-752°F): formation of hydride   /   Above 1000°C (1832°F): very slight solubility of hydrogen   /   In high vacuum above 600-700°C (1112-1292°F): evolution of hydrogen
Hydrogen Peroxide
  Concentrated: good resistance to attack
Hydrogen Sulfide
  At red heat: sulfide formation
Nitric Acid
  Cold and Hot: no attack

  Up to 150°C (302°F): no attack   /   Above 800°C (1472°F): nitride formation
Oxalic Acid
  20-96°C (68-205°F), saturated: no attack
Phosphoric Acid
  85% concentration, 145-210°C (293-410°F): no attack
Potassium Hydroxide
  110°C (230°F), 5% concentration: no attack
Sodium Hydroxide
  100°C (230°F), 5% concentration: no attack 100°C (230°F), 40% concentration: rapid attack

  At red heat: rapid oxidation
Sulfur Dioxide
  Up to 300°C (572°F): stable
Sulfuric Acid
  Cold and hot: no attack

Molten Metals:
  Up to 1200°C (2192°F): resistant
  Up to 1150°C (2102°F): resistant
Lithium, Potassium, Lead
  Up to 1000°C (1832°F): resistant
  Up to 900°C (1652°F): resistant
  Up to 600°C (1112°F): resistant
  Up to 500°C (932°F): resistant

  Up to 450°C (842°F): resistant
Refractory Oxides:
  Up to 1900°C (3452°F): stable
  Up to 1900°C (2912°F): stable
  Up to 1800°C (3272°F): stable
  Up to 1600°C (2912°F): stable
  Up to 1900°C (3452°F): stable

*This table has been created with the best current knowledge. No legal claim can be derived from this information. *